Facial Template

A variant of the Smart Skin system, this system does not offer protection, but the ability to re-shape the face of the user, allowing him to drastically alter his appearance and mimic other persons long term. Like other counter-biometric nanocybernetics, this system includes a specialized nanohive, processor, and a small nanite colony.
It uses the same rules as the Latex Face Mask (p. 338, SR4A). Like the Nanopaste Disguise (p. 338, SR4A), it can be programmed to change texture or to display patterns. The system can also store preset configurations.



Thoughts?

There is already bioware for that in Augmentation. Yours costs way too little Essence.

Good point, that's what I kept in mind too, when designing this system: False Front affects the whole body and offers no PAN integration - this system affects only the head and integrates into the PAN. While they are similar, they offer quite different results.

Of course, there are many systems that exist both as similar cyberware, bioware and nanocybernetics or external gear.

False Front costs 0,2 Esence each level for affecting the whole body, while the other counter-biometric nanocybernetics are level-independent and cost 0,2 Essence each, affecting only a part of the body (Hands, Eyes, Vocal System).
SmartSkin, that provides protection and affects the whole body, too, costs 0,5 Essence each level.

As this modification is certainly not as extensive as SmartSkin nor False Front, it should cost less essence than SmartSkin at least - what would you suggest?

To be honest, I'd just like to see a variation of smartskin(like the orthoskin or false-front upgrades) that let it work like altskin. Turn it on(ouch), set it to one setting, and wait for it to form up.

True, SmartSkin should be able to replicate some effects of Altskin - maybe even Fingerprints.

It's just incompatible with other implanted armor (no stacking internal armor), while the other counter-biometric nanocybernetics are (no armor).
So I tried to keep ths system in line with the latter.